| 标题 |
Structure of fluorine-doped silicon oxide films deposited by plasma-enhanced chemical vapor deposition |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 作者:M. Yoshimaru; S. Koizumi; K. Shimokawa 出版日期:1997-11-01 |
| 求助人 | |
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(2025-6-4)