| 标题 |
Wafer to wafer direct bonding using surfaces activated by hydrogen plasma treatment |
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| 其它 |
期刊:Twenty Fourth IEEE/CPMT International Electronics Manufacturing Technology Symposium (Cat. No.99CH36330) 作者:W.B. Choi; C.M. Ju; B.K. Ju; M.Y. Sung 出版日期:2003-01-20 |
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(2025-6-4)