| 标题 |
Conduction Mechanism and Improved Endurance in HfO2-Based RRAM with Nitridation Treatment |
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| DOI | |
| 其它 |
期刊:Nanoscale Res Lett 作者:Yuan FY, Deng N, Shih CC, Tseng YT, Chang TC, Chang KC, Wang MH, Chen WC, Zheng HX, Wu H, Qian H, Sze SM 出版日期:2017-10-26 |
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(2025-6-4)