| 标题 |
Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests |
| 网址 | |
| DOI |
10.1364/ao.43.004025
doi
|
| 其它 |
期刊:Applied Optics 作者:Patrick P. Naulleau 出版日期:2004-07-09 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
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(2025-6-4)