| 标题 |
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet |
| 网址 | |
| DOI |
10.1117/1.JMM.17.2.023505
doi
|
| 其它 |
期刊:Journal of Micro-nanolithography Mems and Moems 作者:Roberto Fallica; Jarich Haitjema; Lianjia Wu; Sonia Castellanos; Albert M. Brouwer; et al 出版日期:2018-05-10 |
| 求助人 | |
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(2025-6-4)