| 标题 |
The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD |
| 网址 | |
| DOI | |
| 其它 |
期刊:Electrochemical and Solid-State Letters 作者:Jaeyeong Heo; Seok-Jun Won; Dail Eom; Sang Young Lee; Young Bae Ahn; et al 出版日期:2008-01-01 |
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(2025-6-4)