| 标题 |
Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning |
| 网址 | |
| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Yuqing Jin; Takahiro Kozawa; Takao Tamura 出版日期:2021-06-21 |
| 求助人 | |
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(2025-6-4)