| 标题 |
Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2 |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science and Technology 作者:D. Baer; M. Engelhard; A. S. Lea; P. Nachimuthu; T. Droubay; et al 出版日期:2010-09-02 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)