| 标题 |
Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
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| 其它 |
期刊:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 作者:Adam Bertuch; Brent D. Keller; Nicola Ferralis; Jeffrey C. Grossman; Ganesh Sundaram 出版日期:2016-12-23 |
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(2025-6-4)