| 标题 |
Re-examination of the Aqueous Stability of Atomic Layer Deposited (ALD) Amorphous Alumina (Al2O3) Thin Films and the Use of a Postdeposition Air Plasma Anneal to Enhance Stability |
| 网址 | |
| DOI | |
| 其它 |
期刊:Langmuir 作者:Simon A. Willis; Emily K. McGuinness; Yi Li; Mark D. Losego 出版日期:2021-12-01 |
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(2025-6-4)