| 标题 |
Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B 作者:Xiaojian Wu; Shuo Dong; Kaidong Xu; Shiwei Zhuang 出版日期:2026-04-01 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)