| 标题 |
Photopatternable inorganic hardmask |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Alan Telecky; Peng Xie; Jason Stowers; Andrew Grenville; Bruce Smith; et al 出版日期:2010-11-01 |
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(2025-6-4)