| 标题 |
Modeling of plasma processing reactors: review and perspective |
| 网址 | |
| DOI |
10.1117/1.JMM.22.4.041503
doi
|
| 其它 |
期刊:Journal of micro/nanopatterning, materials, and metrology 作者:Shahid Rauf; Kallol Bera; Jason Kenney; Prashanth Kothnur 出版日期:2023-11-22 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
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(2025-6-4)