| 标题 |
Process and characteristics of cobalt films deposited by thermal atomic layer deposition and silicide film formed |
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| 其它 |
期刊:Vacuum 作者:Shuai Yang; Gao Jian-feng; Jinjuan Xiang; Weibing Liu; Yanpeng Hu; et al 出版日期:2025-05-28 |
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(2025-6-4)