| 标题 |
Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation |
| 网址 | |
| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:T. Kozawa 出版日期:2012-07-31 |
| 求助人 | |
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(2025-6-4)