| 标题 |
Systematic investigation of tin-based metal-organic cluster resists for high-resolution next generation lithography |
| 网址 | |
| DOI |
10.1117/12.3091826
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLIII 作者:Sachin .; Manvendra Chauhan; Neha .; Meghana Sharma; Kumar Palit; et al 出版日期:2026-04-09 |
| 求助人 | |
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(2025-6-4)