| 标题 |
A Versatile Photoresist Scaffolding for Tunable Material Property, High‐Contrast Tomographic Volumetric Additive Manufacturing |
| 网址 | |
| DOI | |
| 其它 |
期刊:Advanced Functional Materials 作者:Alexander J. Osterbaan; Gabriel T. Seymour; Robert R. Mcleod; Christopher N. Bowman 出版日期:2026-08-24 |
| 求助人 | |
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(2025-6-4)