| 标题 |
A highly hydroxylated 6-tin oxide cluster serves as an efficient e-beam and EUV-photoresist to achieve high-resolution patterns |
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| DOI | |
| 其它 |
期刊:Nanoscale advances 作者:Cheng-Dun Li; C. S. Chou; Yu‐Fang Tseng; Burn-Jeng Lin; Tsai-Sheng Gau; et al 出版日期:2025-01-01 |
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(2025-6-4)