堆积
交叉口(航空)
位错
分子动力学
材料科学
凝聚态物理
部分位错
从头算
叠加断层
结晶学
化学物理
分子物理学
计算化学
物理
化学
核磁共振
量子力学
工程类
航空航天工程
作者
Luca Barbisan,Emilio Scalise,Anna Marzegalli
标识
DOI:10.1002/pssb.202100584
摘要
The crossing of stacking faults (SFs) (namely dislocation forests) in 3C‐SiC is experimentally probed to cause detrimental effects on the electronic properties of the layer. By means of classical molecular dynamics simulations, for the first time the evolution of two crossing partial dislocation loops is shown, revealing the mechanism that leads to the formation of a complex defect at their intersection. The obtained atomistic structure is then further refined by ab initio calculations, revealing that this defect does not cause defect states within the gap of the pristine material. The case of the intersection of two double‐dislocation loops, that is, involving double SFs, in the hypothesis that the evolution follows the same mechanism found for single‐dislocation loops is also investigated. Contrary to the single‐plane intersection, the simulations reveal that the junction formed by double‐dislocation loops does cause intragap states, thus suggesting detrimental effects on the electronic properties of the 3C‐SiC layers.
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