Wafer-scale detachable monocrystalline germanium nanomembranes for the growth of III–V materials and substrate reuse

The Porous germanium Efficient Epitaxial LayEr Release (PEELER) process is introduced allowing the fabrication of wafer scale detachable monocrystalline Ge nanomembranes compatible with III–V material growth on porous Ge and substrate reuse.