钽
衍射
材料科学
入射(几何)
X射线晶体学
薄膜
光学
冶金
物理
纳米技术
作者
P. A. Yunin,Yu. N. Drozdov,N. S. Gusev
标识
DOI:10.1134/s1027451018040183
摘要
The features of the analysis of thin films by small-angle X-ray reflectometry and grazing incidence X-ray diffractometry are considered by the example of tantalum films. In particular, it is shown that a substantial shift of the diffraction peak at small angles of incidence is associated with the refraction of X-rays near the angle of total external reflection. The results of the measurements are in good agreement with calculations. These factors should be considered in grazing incidence X-ray diffractometry to obtain a correct description of the distribution of the properties of thin films over their depth. It is demonstrated that the approach proposed in this paper can be used to determine the material constants (δ, β) and the thickness of tantalum films.
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