堆积
光电子学
材料科学
肖特基势垒
二极管
肖特基二极管
辐照
泄漏(经济)
降级(电信)
电气工程
化学
工程类
物理
经济
有机化学
核物理学
宏观经济学
作者
Maojiu 茂久 Luo 罗,Yourun 有润 Zhang 张,Yucheng 煜丞 Wang 王,Hang 航 Chen 陈,Rong 嵘 Zhou 周,Zhi 智 Wang 王,Chao 超 Lu 陆,Bo 波 Zhang 张
出处
期刊:Chinese Physics B
[IOP Publishing]
日期:2024-07-12
卷期号:33 (10): 108401-108401
被引量:2
标识
DOI:10.1088/1674-1056/ad6255
摘要
Abstract A comprehensive investigation was conducted to explore the degradation mechanism of leakage current in SiC junction barrier Schottky (JBS) diodes under heavy ion irradiation. We propose and verify that the generation of stacking faults (SFs) induced by the recombination of massive electron--hole pairs during irradiation is the cause of reverse leakage current degradation based on experiments results. The irradiation experiment was carried out based on Ta ions with high linear energy transfer (LET) of 90.5 MeV/(mg/cm 2 ). It is observed that the leakage current of the diode undergoes the permanent increase during irradiation when biased at 20% of the rated reverse voltage. Micro-PL spectroscopy and PL micro-imaging were utilized to detect the presence of SFs in the irradiated SiC JBS diodes. We combined the degraded performance of irradiated samples with SFs introduced by heavy ion irradiation. Finally, three-dimensional (3D) TCAD simulation was employed to evaluate the excessive electron–hole pairs (EHPs) concentration excited by heavy ion irradiation. It was observed that the excessive hole concentration under irradiation exceeded significantly the threshold hole concentration necessary for the expansion of SFs in the substrate. The proposed mechanism suggests that the process and material characteristics of the silicon carbide should be considered in order to reinforcing against the single event effect of SiC power devices.
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