材料科学
电压
铜
接触电阻
光电子学
泄漏(经济)
电流密度
击穿电压
复合材料
电子工程
电气工程
冶金
工程类
物理
经济
宏观经济学
量子力学
图层(电子)
作者
Y. Kagawa,H. Hashiguchi,Takumi Kamibayashi,M. Haneda,Nobutoshi Fujii,Shunsuke Furuse,Takuichi Hirano,Hayato Iwamoto
出处
期刊:International Interconnect Technology Conference
日期:2020-10-05
卷期号:: 148-150
被引量:21
标识
DOI:10.1109/iitc47697.2020.9515663
摘要
In this study, we have successfully demonstrated the 1μm pitch Cu-Cu hybrid bonding technology with remarkable electrical properties and reliabilities. 1μm pitch is world's finest class and is 3 times smaller than the connection pitch of our conventional Cu-Cu hybrid bonding technology. Moreover, the impacts of misalignment between upper Cu pad and lower Cu pad on contact resistance, electro-migration (EM) performance, leakage current and breakdown voltage were also investigated in such ultra-fine Cu-Cu hybrid bonding system.
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