材料科学
碳化硅
肖特基二极管
肖特基势垒
光电子学
金属半导体结
半导体器件
二极管
纳米技术
冶金
图层(电子)
作者
Arthur F. Witulski,Robert Arslanbekov,Ashok Raman,Ronald D. Schrimpf,Andrew L. Sternberg,K.F. Galloway,Arto Javanainen,D.E. Grider,Daniel J. Lichtenwalner,Brett Hull
标识
DOI:10.1109/tns.2017.2782227
摘要
Ion-induced degradation and catastrophic failures in high-voltage SiC Junction Barrier Schottky (JBS) power diodes are investigated. Experimental results agree with earlier data showing discrete jumps in leakage current for individual ions, and show that the boundary between leakage current degradation and a single-event-burnout-like effect is a strong function of LET and reverse bias. TCAD simulations show high localized electric fields under the Schottky junction, and high temperatures generated directly under the Schottky contact, consistent with the hypothesis that the ion energy causes eutectic-like intermixture at the metal- semiconductor interface or localized melting of the silicon carbide lattice.
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