制作
纳米技术
材料科学
纳米光刻
平版印刷术
电子束光刻
纳米结构
抵抗
基质(水族馆)
纵横比(航空)
分辨率(逻辑)
光电子学
计算机科学
海洋学
人工智能
地质学
医学
替代医学
病理
图层(电子)
作者
Jakob Vinje,Kai Sandvold Beckwith,Pawel Sikorski
标识
DOI:10.1109/jmems.2020.2967174
摘要
Flat surfaces decorated with micro- and nanostructures are important tools in biomedical research used to control cellular shape, in studies of mechanotransduction, membrane mechanics, cell migration and cellular interactions with nanostructured surfaces. Existing methods to fabricate surface-bound nanostructures are typically limited either by resolution, aspect ratio or throughput. In this work, we explore electron beam lithography based structuring of the epoxy resist SU-8 on glass substrate. We focus on a systematic investigation of the process parameters and determine limits of the fabrication process, both in terms of spatial resolution, structure aspect ratio and fabrication throughput. The described approach is capable of producing high-aspect ratio, surface bound nanostructures with height ranging from 100 nm to 4000 nm and with in-plane resolution below 100 nm directly on a transparent substrate. Fabricated nanostructured surfaces can be integrated with common techniques for biomedical research, such as high numerical aperture optical microscopy. Furthermore, we show how the described approach can be used to make nanostructures with multiple heights on the same surface, something which is not readily achievable using alternative fabrication approaches. Our research paves an alternative way of manufacturing nanostructured surfaces with applications in life science research. [2019-0255].
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