响应度
光电导性
材料科学
光电子学
化学气相沉积
载流子寿命
薄膜
截止频率
电子迁移率
波长
光电探测器
分析化学(期刊)
硅
化学
纳米技术
色谱法
作者
Benjamin R. Conley,Joe Margetis,Wei Du,Huong Tran,Aboozar Mosleh,Seyed Amir Ghetmiri,John Tolle,Greg Sun,Richard Soref,Baohua Li,Hameed A. Naseem,Shui-Qing Yu
摘要
Thin-film Ge0.9Sn0.1 structures were grown by reduced-pressure chemical vapor deposition and were fabricated into photoconductors on Si substrates using a CMOS-compatible process. The temperature-dependent responsivity and specific detectivity (D*) were measured from 300 K down to 77 K. The peak responsivity of 1.63 A/W measured at 1.55 μm and 77 K indicates an enhanced responsivity due to photoconductive gain. The measured spectral response of these devices extends to 2.4 μm at 300 K, and to 2.2 μm at 77 K. From analysis of the carrier drift and photoconductive gain measurements, we have estimated the carrier lifetime of this Ge0.9Sn0.1 thin film. The longest measured effective carrier lifetime of 1.0 × 10−6 s was observed at 77 K.
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