光掩模
光刻
材料科学
图层(电子)
聚合物
纳米技术
光电子学
光子学
平版印刷术
光子晶体
抵抗
复合材料
作者
Zhanhua Wang,Junhu Zhang,Jing Xie,Yushu Yin,Zhaoyi Wang,Huaizhong Shen,Yunfeng Li,Jiaxin Li,Sen Liang,Liying Cui,Liang Zhang,Hao Zhang,Bai Yang
摘要
Herein, we report a simple method to fabricate patterned organic/inorganic hybrid 1DPCs by top-down assisted photolithography. Versatile colorful pattern with different size and shape can be produced by selectively exposing the 1DPCs under UV light with predesigned photomask directly. The period change, especially the thickness variation of the top polymer layer, is the main reason for the colorful pattern generation. Because of the swelling property of the polymer layers, the pattern color can be modulated by introducing or taking off organic solvents, leading the as-prepared patterned 1DPCs to be effective sensors with high selectivity.
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