材料科学
各向异性
高分辨率透射电子显微镜
打滑(空气动力学)
凝聚态物理
基面
钼
晶体结构
格子(音乐)
Crystal(编程语言)
结晶学
透射电子显微镜
光学
物理
纳米技术
冶金
热力学
化学
计算机科学
声学
程序设计语言
作者
Jean‐Michel Martin,C. Donnet,Th. Le Mogne,Thierry Épicier
出处
期刊:Physical review
[American Physical Society]
日期:1993-10-01
卷期号:48 (14): 10583-10586
被引量:595
标识
DOI:10.1103/physrevb.48.10583
摘要
We have studied the atomistic origins of the ultralow friction coefficient of a molybdenum disulphide (${\mathrm{MoS}}_{2}$) coating in ultrahigh vacuum conditions. A friction coefficient in the ${10}^{\mathrm{\ensuremath{-}}3}$ range is associated with friction-induced orientation of ``easy shear'' basal planes of the ${\mathrm{MoS}}_{2}$ crystal structure parallel to the sliding direction. In addition to this basal plane orientation, an orientation disorder around the c axis is observed, indicating that frictional anisotropy during intercrystallite slip could be at the origin of the vanishing of the friction force. Experimental HRTEM lattice fringe imaging of ${\mathrm{MoS}}_{2}$ wear particles clearly show the existence of characteristic Moir\'e patterns. We have simulated TEM lattice fringe images of a [0001] ${\mathrm{MoS}}_{2}$ crystal and produced rotational Moir\'e patterns by superimposing two such images. A qualitative agreement between experimental and simulated Moir\'e patterns is demonstrated, which gives credence that ultralow friction of ${\mathrm{MoS}}_{2}$ in high vacuum can be attributed to a superlubric situation, by frictional anisotropy of sulphur-rich basal planes during intercrystallite slip.
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