跨导
氮化镓
兴奋剂
材料科学
击穿电压
线性
光电子学
电气工程
电压
拓扑(电路)
晶体管
纳米技术
工程类
图层(电子)
作者
Qian Yu,Chunzhou Shi,Ling Yang,Meng Zhang,Hao Lu,Xu Zou,Bin Hou
标识
DOI:10.1109/imws-amp57814.2023.10381059
摘要
In this article, the AlGaN/GaN/graded-AlGaN/GaN (DCGC) and the AlGaN/GaN/Si-doped graded-AlGaN/GaN (Si-doped DCGC) HEMTs are reported for high linearity. The graded channel can slow down the descent of transconductance ($g_{\mathrm{m}}$). The flatter$g_{\mathrm{m}}$can be achieved by the double-channel devices with a lower graded channel. The current gain cut-off frequency ($f_{\mathrm{T}}$) and the maximum oscillation frequency ($f_{\max}$) decline slowly as the bias voltage increases. Due to the above 200V breakdown voltage and the lower leakage current, the DCGC HEMTs can be used for high-voltage and high-efficiency applications. The 65% of power added efficiency (PAE) and 11.4 W/mm of output power density are achieved by the DCGC HEMTs, at 3.6 GHz, 60V of the$V_{\mathrm{d}}$. The Si-doped DCGC HEMTs are more suitable for low-voltage applications, because of the high saturation output current density and lower knee voltage. The 39.3 dBm of output third-order intercept point (OIP3) and 10.2 dB of OIP3/$P_{\text{DC}}$are realized by Si-doped DCGC HEMTs. The OIP3 is higher than that of the GaN HEMTs.
科研通智能强力驱动
Strongly Powered by AbleSci AI