材料科学
栅栏
光电子学
激光器
光学
包层(金属加工)
分布反馈激光器
反应离子刻蚀
锑
光刻
制作
蚀刻(微加工)
波长
图层(电子)
冶金
复合材料
替代医学
病理
物理
医学
作者
Quentin Gaimard,L. Cerutti,R. Teissier,A. Vicet
摘要
We report on the growth, fabrication, and experimental study of distributed feed-back antimonide diode lasers with buried grating. A second order index-coupled grating was defined by interferometric lithography on the top of the laser waveguide and dry etched by reactive ion etching. The grating was then buried thanks to an overgrowth of the top cladding layer using molecular beam epitaxy. The wafer was then processed using standard photolithography and wet etching into 15 μm-wide laser ridges. Single frequency laser emission at a wavelength of 2.2 μm was measured with a side mode suppression ratio of 34 dB, a maximum output power of 30 mW, and a total continuous tuning range of 6.5 nm.
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