材料科学
图层(电子)
抛光
薄脆饼
电子显微镜
位错
基质(水族馆)
同步加速器
外延
光学
扫描电子显微镜
复合材料
光电子学
海洋学
物理
地质学
作者
Masayuki Sasaki,Kentaro Tamura,Hirotaka Yamaguchi,Hirofumi Matsuhata,Kazutoshi Kojima,Makoto Kitabatake
出处
期刊:Materials Science Forum
日期:2015-06-01
卷期号:821-823: 285-288
被引量:2
标识
DOI:10.4028/www.scientific.net/msf.821-823.285
摘要
Surface defects with scratch-like appearances are often observed locally on 4H-SiC wafers after epitaxial growth. We evaluated such damaged layer which is the cause of local step bunching using Mirror Projection Microscope (MPJ). As a result, MPJ can be detected l damaged layer which could not be detected using Synchrotron X-ray topography, even if these defects are extremely flat surface, no morphology, damaged layer is used to exist on the subsurface region. Thus, MPJ can be detected dislocation loops on the subsurface region of damage, it is effective to elucidate damaged layer of polishing process, MPJ is to be one of the candidates for inspection techniques of the damaged layer at substrate surface.
科研通智能强力驱动
Strongly Powered by AbleSci AI