材料科学
闪存
结晶
闪光灯(摄影)
光电子学
硅
频道(广播)
图层(电子)
存储单元
镍
电子工程
电气工程
晶体管
光学
纳米技术
计算机科学
冶金
计算机硬件
工程类
物理
化学工程
电压
作者
Naonori Ishihara,Y. Shimada,T. Ochi,S. Seto,Hiroshi Matsuo,H. Yamashita,Satoshi Morita,Masayuki Ukishima,K. Uejima,Y. Arayashiki,Shoichi Kajiwara,A. Murayama,K. Nishiyama,Kikuko Sugimae,Shunsuke Mori,Yuji Saito,Takeshi Shundo,Atsutaka Maeda,H. Kamiya,Yohji Uchiyama
标识
DOI:10.23919/vlsitechnologyandcir57934.2023.10185401
摘要
State-of-the-art Metal Induced Lateral Crystallization (MILC) techniques have been demonstrated for 3D flash memory with ultra-high (over 300) layers. For the first time, 14$-\mu$m-long macaroni silicon (Si) channels in vertical memory hole are fully single-crystallized. Furthermore, by using newly developed nickel (Ni) gettering technique, the 112 word-line-layer 3D flash memory exhibits cell array performances such as read noise reduction of 40% or more, and 10-times channel conductance without any degradations of cell reliability.
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