材料科学
透射电子显微镜
微观结构
成核
降水
扫描电子显微镜
堆积
图层(电子)
叠加断层
过饱和度
复合材料
结晶学
纳米技术
位错
核磁共振
物理
热力学
气象学
有机化学
化学
作者
Bart J. Kooi,Matthias Kabel,A.B. Kloosterman,J. Th. M. De Hosson
出处
期刊:Acta Materialia
[Elsevier BV]
日期:1999-08-01
卷期号:47 (10): 3105-3116
被引量:101
标识
DOI:10.1016/s1359-6454(99)00151-2
摘要
Abstract A detailed description is given of the microstructure of the top layer of Ti–6Al–4V with SiC particles embedded with a high-power Nd:Yag laser system. Scanning electron microscopy (SEM), as well as conventional, analytical and high-resolution transmission electron microscopy (TEM) were used. An existing controversy about the presence or absence of Ti3SiC2 in the reactive SiC/Ti systems is clarified and the first observations of Ti5Si3 precipitation on stacking faults in Si supersaturated TiC are reported. The Si released during the reaction SiC+Ti→TiC+Si results in the formation of Ti5Si3. If in the reaction layer regions in between the TiC grains become enclosed, the rejected Si content increases locally and Ti3SiC2 plates with dominant (0001) facets nucleate. In the TiC grains particularly of the cellular reaction layer, a high density of widely extending stacking faults of the order of 100 nm is observed and on these faults in many instances small Ti5Si3 precipitates are present.
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