计量学
覆盖
覆盖层
薄脆饼
衍射
计算机科学
光学
材料科学
光电子学
物理
程序设计语言
凝聚态物理
作者
Jae‐Il Lee,Iksun Park,Youngjin Park,Jisung Hwang,Hyeonjun Ha,Jeongwon Sohn,Jaehee Lee,Jin-Seok Moon,Yuki Kondo,Satoshi Ando
摘要
An absolute alignment measurement of an underlayer and overlayer of overlay mark enables an innovative overlay control by which each layer’s grid errors can be independently corrected, versus of a conventional relative overlay measurement and control. We demonstrate an absolute alignment measurement of stacked overlay marks such as Diffraction-Based Overlay (DBO) by adopting a unique method incorporated in a standalone, image-based alignment metrology system. An alignment accuracy of each layer is evaluated using product wafers by comparing alignment measurement result to the reference data. In conclusion, we were able to achieve R2>0.97 coefficient.
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