Chemical Vapor Deposition and Atomic Layer Deposition of Coatings for Mechanical Applications

Abstract This paper provides an overview of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes and the advantages they offer physical vapor deposition for the application of friction and wear coatings for micromechanical assemblies and components. It explains how hard and solid lubricant phases can be applied by these non-line-of-sight deposition methods, achieving nanoscale conformality and coating uniformity on buried surfaces and interfaces. It also discusses inherent disadvantages and explains how plasma excitation can be incorporated in either process to overcome material limitations.