Subbandgap Photocurrent of a Ru‐Covered n‐GaAs|Acidic‐Electrolyte Junction
作者
Ch. Jung,D.M. Kolb
出处
期刊:Berichte der Bunsengesellschaft für physikalische Chemie日期:1990-08-01卷期号:94 (8): 861-866被引量:8
标识
DOI:10.1002/bbpc.19900940809
摘要
Abstract The subbandgap photocurrent dependence on electrode potential and light energy has been investigated for the n‐GaAs(100) | 1 M HCl junction after surface modification by electroless deposition of ruthenium. A pronounced peak in the photocurrent‐potential curve was found for Ru‐treated electrodes between −0.6 and −0.1 V/SCE. This behaviour is explained in a model simulation for the photocurrent which takes into account the hole generation in a Ru‐induced surface state by absorption of subbandgap light.