接触电阻
范德瓦尔斯力
材料科学
肖特基势垒
石墨
电极
场效应晶体管
磁滞
光电子学
电介质
晶体管
纳米技术
凝聚态物理
电气工程
化学
电压
图层(电子)
复合材料
物理
有机化学
物理化学
工程类
分子
二极管
作者
Muhammad Awais Aslam,Simon Leitner,Shubham Tyagi,Alexandros Provias,Vadym Tkachuk,Egon Pavlica,Martina Dienstleder,Daniel Knez,Kenji Watanabe,Takashi Taniguchi,Dayu Yan,Youguo Shi,Theresia Knobloch,Michael Waltl,Udo Schwingenschlögl,Tibor Grasser,Aleksandar Matković
出处
期刊:Nano Letters
[American Chemical Society]
日期:2024-05-24
卷期号:24 (22): 6529-6537
被引量:29
标识
DOI:10.1021/acs.nanolett.4c00956
摘要
High Resolution Image Download MS PowerPoint Slide Contact resistance is a multifaceted challenge faced by the 2D materials community. Large Schottky barrier heights and gap-state pinning are active obstacles that require an integrated approach to achieve the development of high-performance electronic devices based on 2D materials. In this work, we present semiconducting PtSe 2 field effect transistors with all-van-der-Waals electrode and dielectric interfaces. We use graphite contacts, which enable high I ON / I OFF ratios up to 10 9 with currents above 100 μA μm –1 and mobilities of 50 cm 2 V –1 s –1 at room temperature and over 400 cm 2 V –1 s –1 at 10 K. The devices exhibit high stability with a maximum hysteresis width below 36 mV nm –1 . The contact resistance at the graphite–PtSe 2 interface is found to be below 700 Ω μm. Our results present PtSe 2 as a promising candidate for the realization of high-performance 2D circuits built solely with 2D materials.
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