材料科学
阈下斜率
阈下传导
场效应晶体管
晶体管
光电子学
有机场效应晶体管
阈值电压
陡坡
电压
电气工程
工程类
岩土工程
作者
Fangxu Yang,Lingjie Sun,Jiangli Han,Baili Li,Xi Yu,Xiaotao Zhang,Xiaochen Ren,Wenping Hu
标识
DOI:10.1021/acsami.7b16658
摘要
Anodization is a promising technique to form high- k dielectrics for low-power organic field-effect transistor (OFET) applications. However, the surface quality of the dielectric, which is mainly inherited from the metal electrode, can be improved further than other fabrication techniques, such as sol–gel. In this study, we applied the template stripping method to fabricate a low-power single-crystalline OFET based on the anodized AlO x dielectric. We found that the template stripping method largely improves the surface roughness of the deposited Al and allows for the formation of a high-quality AlO x high- k dielectric by anodization. The ultraflat AlO x /SAM dielectric combined with a single-crystal 2,6-diphenylanthracene (DPA) semiconductor produced a nearly defect-free interface with a steep subthreshold swing (SS) of 66 mV/decade. The current device is a promising candidate for future ultralow-power applications. Other than metal deposition, template stripping could provide a general approach to improve thin-film quality for many other types of materials and processes.
科研通智能强力驱动
Strongly Powered by AbleSci AI