Direct Nanoimprint Lithography of Polyethersulfone Using Cellulose‐Based Mold

Abstract Polyethersulfone (PES) with a glass transition temperature of 224 °C is a class of high‐performance super engineering plastics with excellent heat resistance, as well as mechanical, electrical, and optical properties. However, the nanopatterning of PES using thermal nanoimprint lithography at a high temperature can induce technical difficulties. High‐accuracy 900‐nm line patterning of PES is fabricated 50 times using both a solvent‐permeable cellulose‐based mold and dimethylformamide as a dilution solvent in direct thermal nanoimprint lithography. The use of dilution solvents in PES has yet been limited in the nanoimprint lithography, and the developed processes expand the surface patterning of super engineering plastic.