材料科学
MOSFET
CMOS芯片
晶体管
光电子学
碳化硅
电气工程
场效应晶体管
电子工程
阈值电压
数码产品
模拟电子学
数字电子学
电子线路
电压
工程类
冶金
作者
Jiarui Mo,Yunfan Niu,Alexander May,Mathias Rommel,Chiara Rossi,Joost Romijn,Guoqi Zhang,Sten Vollebregt
摘要
Integrated circuits based on wide bandgap semiconductors are considered an attractive option for meeting the demand for high-temperature electronics. Here, we report an analog-to-digital converter fabricated in a silicon carbide complementary metal–oxide–semiconductor technology now available through Europractice. The MOSFET component in this technology was measured up to 500 °C, and the key parameters, such as threshold voltage, field-effect mobility, and channel-length modulation parameters, were extracted. A 4-bit flash data converter, consisting of 266 transistors, is implemented with this technology and demonstrates correct operation up to 400 °C. Finally, the gate oxide quality is investigated by time-dependent dielectric breakdown measurements at 500 °C. A field-acceleration factor of 4.4 dec/(MV/cm) is obtained by applying the E model.
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