钯
材料科学
化学气相沉积
沉积(地质)
纳米技术
有机化学
催化作用
化学
生物
古生物学
沉积物
作者
Zheng Yuan,Richard J. Puddephatt
标识
DOI:10.1002/adma.19940060109
摘要
Chemical vapor deposition (CVD) of palladium is at present not used commercially, despite the widespread use of palladium films in electronics and data storage, because suitable precursors are not available. New palladium precursors, ally (β‐diketonato)palladium(II) complexes (see Figure) are reported, along with the conditions required for the formation of pure palladium films by CVD. magnified image
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