An Amorphous Native Oxide Shell for High Bias‐Stress Stability Nanowire Synaptic Transistor

Abstract The inhomogeneous native oxide shells on the surfaces of III–V group semiconductors typically yield inferior and unstable electrical properties metrics, challenging the development of next‐generation integrated circuits. Herein, the native GaO x shells are profitably utilized by a simple in‐situ thermal annealing process to achieve high‐performance GaSb nanowires (NWs) field‐effect‐transistors (FETs) with excellent bias‐stress stability and synaptic behaviors. By an optimal annealing time of 5 min, the as‐constructed GaSb NW FET demonstrates excellent stability with a minimal shift of transfer curve (Δ V th ≈ 0.54 V) under a 60 min gate bias, which is far more stable than that of pristine GaSb NW FET (Δ V th ≈ 8.2 V). When the high bias‐stress stability NW FET is used as the chargeable‐dielectric free synaptic transistor, the typical synaptic behaviors, such as short‐term plasticity, long‐term plasticity, spike‐time‐dependent plasticity, and reliable learning stability are demonstrated successfully through the voltage tests. The mobile oxygen ion in the native GaO x shell strongly offsets the trapping states and leads to enhanced bias‐stress stability and charge retention capability for synaptic behaviors. This work provides a new way of utilizing the native oxide shell to realize stable FET for chargeable‐dielectric free neuromorphic computing systems.