材料科学
薄膜
耐久性
光电子学
过程(计算)
金属
纳米技术
工程物理
复合材料
冶金
计算机科学
工程类
操作系统
作者
Jesse D. Wolfe,Ronald E. Laird,C.K. Carniglia,J.P Lehan
出处
期刊:
日期:1995-01-01
卷期号:: TuB3-TuB3
被引量:10
标识
DOI:10.1364/oic.1995.tub3
摘要
Various types of thin film designs which incorporate silver metal are well known. The chemical and mechanical durability of these films is usually poor. This fact limits the practical application of the films. A new process has been developed which allows the use of silver metal in various types of thin film designs such as wide-band anti-reflecting and wide-band high reflecting films. This paper describes the patented process and designs used to deposit these film stacks.
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