Quantitative Electron Energy Loss Spectroscopy (EELS) Analysis of Flowable CVD Oxide for Shallow Trench Isolation of finFET Integration

Journal Article Quantitative Electron Energy Loss Spectroscopy (EELS) Analysis of Flowable CVD Oxide for Shallow Trench Isolation of finFET Integration Get access J Li, J Li IBM Research, Albany, NY 12203 Email: juntaoli@us.ibm.com, Tel: (518) 292-7419 Search for other works by this author on: Oxford Academic Google Scholar J Bruley, J Bruley IBM Research, Yorktown Heights, NY 10598 Search for other works by this author on: Oxford Academic Google Scholar R Conti, R Conti IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar M Belyansky, M Belyansky IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar S Metha, S Metha IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar J Strane, J Strane IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar L Tai, L Tai IBM Systems, Hopewell Junction, NY 12533 Search for other works by this author on: Oxford Academic Google Scholar L Jiang, L Jiang IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar J Demarest, J Demarest IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar J Gaudiello, J Gaudiello IBM Research, Albany, NY 12203 Search for other works by this author on: Oxford Academic Google Scholar ... Show more Y Zhu, Y Zhu IBM Research, Yorktown Heights, NY 10598 Search for other works by this author on: Oxford Academic Google Scholar A Grill A Grill IBM Research, Yorktown Heights, NY 10598 Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 23, Issue S1, 1 July 2017, Pages 1462–1463, https://doi.org/10.1017/S1431927617007978 Published: 04 August 2017