Noble Metal-Free SnO 2 /Nanoporous Zn-Based Hydroquinone Thin Film Sensor for Ultrasensitive Hydrogen Detection

材料科学 贵金属 薄膜 氢传感器 基质(水族馆) 介孔材料 化学工程 纳米技术 原子层沉积 吸附 对苯二酚 氧气 微型多孔材料 光电子学 纳米孔 气体扩散 沉积(地质) 半导体 无机化学 多孔性 多孔硅
作者
Xin-Yue Zhang,Shuai Zhang,Chen Wang,Qiang Ren,Lin Zhu,Di Wu,Ai-Dong Li
出处
期刊:ACS Applied Materials & Interfaces [American Chemical Society]
卷期号:18 (1): 1975-1984
标识
DOI:10.1021/acsami.5c18721
摘要

Developing high-performance hydrogen sensors without noble metals remains challenging for green hydrogen energy industry applications. In this paper, a kind of simple-architecture and high-performance hydrogen sensor based on SnO2/porous zinc hydroquinone (Zn-HQ) hybrid thin film has been developed on a Si substrate by atomic/molecular layer deposition (ALD/MLD). By introducing a 20 nm thick mesoporous Zn-HQ thin film, a 14 nm thick SnO2/Zn-HQ sample shows excellent hydrogen-sensing performance and selectivity without noble metal modification. The response value reaches 112.54@30 ppm of H2 at 125 °C with a response time of 26 s and a recovery time of 222.5 s, respectively. The mechanism for improved hydrogen sensitivity based on the SnO2/porous Zn-HQ structure is proposed. On the one hand, Zn-HQ hybrid film can extract oxygen from SnO2, while the porous structure in the film also provides channels for the diffusion of oxygen ions, thereby generating more oxygen vacancy active sites in SnO2 films. On the other hand, the mesoporous Zn-HQ film induces the formation of numerous shallow nanopores on the SnO2 surface by ALD conformal deposition, increasing the specific surface area for gas adsorption. Simultaneously, density functional theory (DFT) calculations confirm that H2 has the highest adsorption energy compared with several interfering gases of CO, CH4, NH3, H2S, and C2H5OH in the SnO2 model containing oxygen vacancies. In summary, this work provides a new strategy for the construction of highly sensitive, selective, and reliable noble metal-free thin film hydrogen sensors at relatively low working temperature. Furthermore, the versatile ALD/MLD technology compatible with silicon technology also opens more possibilities and opportunities for the miniaturization and integration of thin film hydrogen sensors in microelectro-mechanical and artificial intelligent systems.
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