紫外线
材料科学
光电子学
透射率
异质结
氧化铟锡
铟
硅
太阳能电池
氧化物
聚合物太阳能电池
光学
紫外线辐射
近紫外
太阳能
反射率
紫外线
氧化铝
防反射涂料
量子点太阳电池
作者
Yunren Luo,Yue Yuan,Chen Qiu,Fei Wang,Junlin Du,Jianhua Shi,韩安军,Bin Chen,Qiang Wang,Jiong Yang,Zhenzhu Zhao,Liping Zhang,Wenzhu Liu,Zhengxin Liu,Fanying Meng
标识
DOI:10.1016/j.solmat.2026.114754
摘要
The application of silicon heterojunction (HJT) solar cells in space environments faces a critical challenge from ultraviolet-induced degradation (UVID). In this work, high-quality zinc doped indium oxide (IZO) films with narrow bandgap were prepared by reactive plasma deposition (RPD). UV irradiation can cause the breakage of some Zn-O bonds, facilitating the formation of oxygen vacancies. This enhances the electrical conductivity of IZO and reduces work function, thereby improving energy level alignment with the n-type doped layer and promoting electron transport. HJT solar cells with IZO exhibited excellent resistance to UV irradiation. After exposure to 3000 equivalent sun hours (ESH) of UV irradiation, the IZO cells demonstrated a remarkable 4.0% increase in power conversion efficiency (PCE), driven by an 8.4% improvement in fill factor (FF). These findings establish IZO as a promising UV-resistant transparent conductive oxide for high-stability HJT solar cells in low earth orbit space applications.
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