In Situ Dewetting Assisted Plasma Etching of Large‐Scale Uniform Nanocones on Arbitrarily Structured Glass Elements

Abstract Nanocones are ideal for wide‐angle antireflection of glass elements, yet their applications often encounter complex geometries and large sizes, bringing serious difficulty in developing a reliable and efficient manufacturing process. Here, an in situ dewetting assisted plasma etching (In situ DAPE) method is proposed to engrave nanocones on arbitrarily structured glass elements in one step. While exposed to high‐energy plasma, pre‐sputtered platinum (Pt) film undergoes dewetting, forming uniformly distributed nanoparticles that act as in situ sacrificial masks for plasma etching to generate nanocones. The nanocone size is decided by nanoparticle size, which can be modified through the Marangoni effect of the melted Pt film. Incorporating a passivation step can improve the aspect ratio of nanocones up to ≈8:1 due to the trench effect. Nanocones with diameters ranging from 62 to 136 nm and heights from 126 to 942 nm can be achieved. The nanocones help to achieve an average transmittance of 98% over the 0.3–2.5 µm spectrum and a 79.4% laser‐induced damage threshold of bare fused silica. The efficient fabrication of nanocones over multiple glass elements is demonstrated including a 2‐inch flat window, cylindrical microlens array, and diffractive grating, highlighting the efficacy of the In situ DAPE method for high‐performance optical elements.