热导率
材料科学
薄膜
氮化硅
硅
热导率测量
二氧化硅
基质(水族馆)
电导率
光电子学
复合材料
纳米技术
化学
海洋学
地质学
物理化学
作者
S. A. Govorkov,W. Ruderman,Mark W. Horn,Russell B. Goodman,M. Rothschild
摘要
A new, relatively inexpensive, easy-to-use instrument has been developed for measuring the thermal conductivity of thin films based on a differential photoacoustic method. Measurements made on silicon dioxide and silicon nitride are consistent with those reported previously for a different technique. In addition, the room temperature thermal conductivity of conventional polymer thin films and plasma deposited thin films has been determined relative to thermally grown silicon dioxide. Knowledge of the thermal conductivity of thin films, which is critical for many applications, can now be obtained for any thin film which can be deposited on a high thermal conductivity substrate.
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