Electrodeposited MoS2 film on nickel foam as a binder-free electrode for supercapacitors

In this work, MoS 2 was successfully deposited on Ni foam (NF) by a simple one-step electrochemical deposition method. MoS 2 were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), X-ray photoelectron spectrum (XPS) and energy dispersive spectrometer (EDS). XRD and FESEM results show that MoS 2 is an amorphous film structure. The electrochemical properties of the MoS 2 electrode have been studied in detail via cyclic voltammetry (CV), galvanostatic charge-discharge (GCD) and electrochemical impedance spectroscopic (EIS) technology, respectively. The MoS 2 /NF binder-free electrode provides a special capacitance of 210 F/g at a constant discharge current density of 1 A/g. When the current density increases five times, the specific capacitance can still maintain 51.74% of the initial capacitance. In addition, after 1000 cycles at 3 A/g, the capacitance retention of the MoS 2 electrode still retained 79.4%.