3D resist master evaluation protocol for nanoimprint lithography

Nanoimprint Lithography (NIL) is a lithography technique suitable for mass production because it can replicate complex patterns down to the nanometer scale with reduced time and cost. The master is one of the key elements of NIL. It determines the resolution of the replicated patterns and plays a role in defectivity. Therefore, it must be characterized to control the replication as properly as possible. Here, we target to create a resist master to achieve 3D structures. This master is made by grayscale electron beam lithography to obtain submicron resolution. In this study, full characterization of structures are presented to validate resist master quality.